ROC-650 wafer two fluid cleaning machine

Category：Industrial Cleaning
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Release date：2020-05-06
在線詢價(jià)

Detailed introduction

Name: wafer cleaning machine

Brand: ROC

Model: ROC-650

Device appearance

Fixture schematic

Wafer cleaning machine ROC-650 cleaning machine Process:

Put in the material---one-key cleaning starts, the safety door closes automatically---two-fluid cleaning---centrifugal dehydration (de-static ion wind and heating chamber auxiliary drying)---cleaning---alarm prompt--- The glass door opens automatically.

High-speed centrifugal design, mainly used for precision cleaning of 4-12 inch silicon wafers; with two-fluid cleaning, static elimination / nitrogen,

High-speed centrifugation and other devices make the parts to be cleaned dry and clean.

Wafer cleaning machine ROC-650 cleaning machine Equipment reliability:

All imported accessories to ensure product quality;

More than 3 years experience in technical assembly;

The equipment will be operated for 30 hours before leaving the factory, testing equipment stability and cleaning ability test;

Crystal cleaning machine ROC-650 cleaning machine quality assurance:

The filter system is externally placed;

The water and gas pressure regulating valve is external.

Cleaning and drying are completed to ensure the cleaning quality.

Wafer cleaning machine ROC-650 cleaning machine Features:

▲ replaceable cleaning suction cups, can use 4-12 inch cleaning suction cups;

▲Operation procedures can be programmed and adjusted according to the operation requirements. The equipment operation process, cleaning time and various parameters can be compiled by themselves;

▲The equipment running status and parameters are monitored online in real time, and the automatic door is equipped with a safety grating to ensure safe operation;

▲Using vacuum adsorption cleaning disc, the pick and place of the crystal element fixture is safer and more convenient;

Wafer cleaning machine ROC-650 cleaning machine Technical parameters：

Device size	700mm（L）×650mm（W）×1100mm（H）
Cleaning plate specification	4-12 inches (optional)
Cleaning disk size	custom made
Pure water inlet path	Ø8mm outer diameter pure water hose
Drainage exit path	3/4′′ hose
Gas source inlet diameter	Ø12mm PU air pipe
Air outlet	2.5′′ leather pipe joint (75mm outer diameter)
power supply	AC220V; 50HZ ;5A
Total power	1.5KW
power consumption	When cleaning: 1.5kw/h	Standby time: 0.5kw/h
Gas supply	0.45-0.7Mpa
DI water supply	＞0.35Mpa
Cleaning pressure	3.8-8Kgf/cm²
Centrifugal speed	100-2000R/Min
Transmission horsepower	1HP
Pure water consumption	0-1000ML/Min
Gas consumption	200-500L/Min
Air filtration	One-stage 0.01μm degreasing filter; two-stage 0.01μm precision filter
Environmental filtering	0.3μm；99.99%
Machine net weight	About 200KG